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Brian S Maxwell

from Brockton, MA
Age ~47
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Also known as:
Brian Seth Maxwell, Brain S Maxwell, Brania Garcia
Phone and address:
957 Warren Ave, Brockton, MA 02301
Related to:
Zenobia Maxwell, 81
Connected to:
Adrianna D Maxwell, 31Alecia Maxwell, 62Bernadette R Maxwell, 72Bernie Maxwell, 81Blair L Maxwell, 45Blane MaxwellCharles D Maxwell, 64Clay E Maxwell, 38Clint R Maxwell, 42Curtis Maxwell, 82

Brian Maxwell Phones & Addresses

  • 957 Warren Ave, Brockton, MA 02301
  • Kennesaw, GA
  • Nashua, NH
  • Boston, MA
  • 2 Winnepurkit Ave, Lynn, MA 01905 (781) 592-0068
  • Springfield, MA
  • Pawtucket, RI

Specialities

Property Management

Resumes

Resumes

Brian Maxwell Photo 1

Brian Maxwell Chula Vista, CA

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Work:
ResMed Corporation

Jul 2012 to 2000
Dental Sleep Specialist
Pitney Bowes
San Diego, CA
2010 to 2012
Senior Area Sales Executive
Pitney Bowes

2010 to 2010
Dental Sales Representative
DenTech Dental Laboratory
Costa Mesa, CA
2009 to 2010
Sales Representative
Innova-Life/Sybron Implants
Orange, CA
2006 to 2008
Territory Sales Manager
Prosthetics Division
Atlanta, GA
2002 to 2006
District Sales Manager
Brian Maxwell Photo 2

Brian Maxwell Boston, MA

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Work:
Alorica/Verizon Wireless
Kennesaw, GA
Jan 2009 to Aug 2011
Call Center Representative
Kroger Supermarket
Kennesaw, GA
Oct 2007 to Feb 2009
Fuel Center Attendant
Macy's Department Store
Cambridge, MA
Jul 2005 to Jan 2007
Sales Associate/Trim Lead
Palladion Security
Boston, MA
Jul 2003 to Jun 2005
Concierge/Security
Blue Cross Blue Shield
Boston, MA
Nov 2000 to Jun 2003
Concierge/Security
Education:
Gibbs College Boston
Boston, MA
Apr 2002 to Jun 2004
Associate of Applied Science in Visual Communication
School of The Museum Of Fine Arts
Boston, MA
Jan 2001 to Jan 2001
2D Animation- Certificate
Lynn Classical High school
Lynn, MA
Jan 1991 to Jan 1995
College Prepatory Classes
Skills:
Illustration, Operating Cash Register, Microsoft Word, Adobe Photoshop CS, Adobe Illustrator

Business Records

Name / Title
Company / Classification
Phones & Addresses
Brian Maxwell
Owner
Brimax Illustration
Commercial Art/Graphic Design
4293 Monticello Way NW, Kennesaw, GA 30144
Brian Maxwell
Co-Owner
Remember When
Ret Misc Apparel/Accessories
8 Grn St, Randolph, MA 02368
(781) 885-1957
Brian K. Maxwell
MAXWELL PERFORMANCE HORSES, LLC
Brian J Maxwell
MPFFFFL LOTTERY GROUP, LLC
Brian J. Maxwell
PROPERTY SOLUTIONS OF NORTHEAST OHIO, LLC
Brian J. Maxwell
AURORA RAPTORS, INC

Publications

Wikipedia

Brian Maxwell

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Brian Leigh Maxwell (1953, London, England March 19, 2004, San Anselmo, California) was a Canadian athlete, track coach, entrepreneur and philanthropist . ...

Us Patents

Production Of Acetal Derivatized Hydroxyl Aromatic Polymers And Their Use In Radiation Sensitive Formulations

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US Patent:
6380317, Apr 30, 2002
Filed:
Oct 26, 1999
Appl. No.:
09/427159
Inventors:
Sanjay Malik - Attleboro MA
Andrew J. Blakeney - Seekonk MA
Lawrence Ferreira - Fall River MA
Joseph J. Sizensky - Seekonk MA
Brian E. Maxwell - Rumford RI
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
C08F25700
US Classification:
525266, 525312, 525384
Abstract:
The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.

Production Of Acetal Derivatized Hydroxyl Aromatic Polymers And Their Use In Radiation Sensitive Formulations

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US Patent:
61596531, Dec 12, 2000
Filed:
Apr 14, 1998
Appl. No.:
9/059864
Inventors:
Sanjay Malik - Attleboro MA
Andrew J. Blakeney - Seekonk MA
Lawrence Ferreira - Fall River MA
Joseph J. Sizensky - Seekonk MA
Brian E. Maxwell - Rumford RI
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03C 1705
G03C 100
US Classification:
4302701
Abstract:
The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.

Production Of Acetal Derivatized Hydroxyl Aromatic Polymers And Their Use In Radiation Sensitive Formulations

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US Patent:
63097931, Oct 30, 2001
Filed:
Nov 1, 2000
Appl. No.:
9/704203
Inventors:
Sanjay Malik - Attleboro MA
Andrew J. Blakeney - Seekonk MA
Lawrence Ferreira - Fall River MA
Joseph J. Sizensky - Seekonk MA
Brian E. Maxwell - Rumford RI
Assignee:
Arch Specialty Chemicals, Inc. - Norwalk CT
International Classification:
G03F 7039
G03F 7004
US Classification:
4302701
Abstract:
The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.

Production Of Acetal Derivatized Hydroxyl Aromatic Polymers And Their Use In Radiation Sensitive Formulations

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US Patent:
6133412, Oct 17, 2000
Filed:
Oct 26, 1999
Appl. No.:
9/427160
Inventors:
Sanjay Malik - Attleboro MA
Andrew J. Blakeney - Seekonk MA
Lawrence Ferreira - Fall River MA
Joseph J. Sizensky - Seekonk MA
Brian E. Maxwell - Rumford RI
Assignee:
Arch Chemicals, Inc. - Norwalk CT
International Classification:
C08G 6534
C08J 513
US Classification:
528425
Abstract:
The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
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Brian S Maxwell from Brockton, MA, age ~47 Get Report