Christopher Ceccarelli

52779874, Jan 11, 1994

Feb 1, 1991

7/649647

Diwakar Garg - Macungie PA
Paul N. Dyer - Allentown PA
Robert E. Stevens - Emmaus PA
Christopher Ceccarelli - Whitehall PA

Air Products and Chemicals, Inc. - Allentown PA

B05B 1504

428457

An extremely hard, fine grained tungsten carbide produced by thermochemical deposition is described. The tungsten carbide consists primarily of substantially pure tungsten carbide wherein the tungsten carbide consists of WC. sub. 1-x, where x is 0 to about 0. 4. The disclosed tungsten carbide is free of columnar grains and consists essentially of extremely fine, equiaxial crystals. Also disclosed is a method of producing the disclosed material.

49100912, Mar 20, 1990

Feb 27, 1989

7/316369

Diwaker Garg - Macungie PA
Beth A. Klucher - Sherman Oaks CA
Paul N. Dyer - Allentown PA
Richard W. Kidd - Newhall CA
Christopher Ceccarelli - Whitehall PA

Air Products and Chemicals, Inc. - Allentown PA

B22F 708

428552

Extremely hard, fine grained tungsten/carbon alloys are described which are produced by thermochemical deposition. The alloys consist primarily of a mixture of a substantially pure tungsten phase and at least one carbide phase wherein the carbide phase consists of W. sub. 2 C or W. sub. 3 C or a mixture of W. sub. 2 C and W. sub. 3 C. The disclosed tungsten/carbon alloys are free of columnar grains and consist essentially of extremely fine, equiaxial crystals. Also disclosed is a method of producing the disclosed material.

48746428, Oct 17, 1989

Sep 3, 1987

7/092809

Diwaker Garg - Macungie PA
Beth A. Klucher - Sherman Oaks CA
Paul N. Dyer - Allentown PA
Richard W. Kidd - Newhall CA
Christopher Ceccarelli - Whitehall PA

Air Products and Chemicals, Inc. - Allentown PA

C23C 1632

427249

A method for producing the disclosed material comprises introducing into a chemical vapor deposition (CVD) reactor a mixture of process gases comprised essentially of (1) tungsten hexafluoride, (2) a volatile oxygen- and hydrogen-containing organic compound, and (3) hydrogen; controlling the ratio of the tungsten hexafluoride to the oxygen- and hydrogen-containing organic compound within the CVD reactor so that the W/C atomic ratio is within the range of about 0. 5 to about 15; controlling the reaction temperature so it is within the range of above about 300. degree. to less than about 650. degree. C. ; controlling the total pressure within the range of about 1 Torr. to about 1,000 Torr. ; and controlling the ratio of H. sub. 2 to WF. sub. 6 within the range of about 4 to about 20; to produce W and W. sub.