Ginetto Addiego

6645061, Nov 11, 2003

Nov 16, 1999

09/441633

Doyle E. Bennett - Santa Clara CA
Thomas H. Osterheld - Mountain View CA
Fred C. Redeker - Fremont CA
Ginetto Addiego - Berkeley CA

Applied Materials, Inc. - Santa Clara CA

B24D 1100

451527, 451550

A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.

53877888, Feb 7, 1995

Mar 5, 1993

8/027210

Michael J. Miller - Sunnyvale CA
Ginetto Addiego - Berkeley CA
Francois J. Henley - Los Gatos CA

Photon Dynamics, Inc. - San Jose CA

G01J 120

2502011

An imaging method creates a two-dimensional image of a voltage distribution or a capacitance distribution of a substrate under test using an electro-optic modulator. A coarse modulator calibration determines the effect of non-uniformities in the modulator and determines a look-up table relating the gap distance between the modulator and the substrate to the intensity of the light emerging from the modulator. A positioning means calibration determines a look-up table relating control voltage to response by the positioning means. The modulator is moved over a portion of the substrate and then undergoes a positioning step, a fine onsite calibrating step, and a measuring step. The positioning step can be accomplished using the intensity of emerging light to determine modulator gap distance, and the response verses control voltage look-up table to determine a control signal to vertically position the modulator. The look-up tables permit the modulator to be position substantially parallel to the substrate at a desired gap distance using one step positioning.

61394068, Oct 31, 2000

Jun 24, 1997

8/879447

Daniel Kennedy - San Jose CA
Boris Fuksshimov - San Jose CA
Victor Belitsky - Sunnyvale CA
Boris Fishkin - San Carlos CA
Kyle Brown - Sunnyvale CA
Tom Osterheld - Mountain View CA
Jeff Beeler - Campbell CA
Ginetto Addiego - Berkeley CA

Applied Materials, Inc. - Santa Clara CA

B24B 700

451 67

The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

59175885, Jun 29, 1999

Nov 4, 1996

8/743998

Ginetto Addiego - Berkeley CA

KLA-Tencor Corporation - San Jose CA

G01N 2188

356237

An automated inspection system and method replaces human visual inspection of the surface of a specimen having distinguishing features or anomalies that are detectable under either one or a combination of bright field and dark field illumination. A preferred embodiment is an after develop inspection macro (ADI Macro) defect inspection system that inspects the patterned surface of a semiconductor wafer for large scale (i. e. , greater than about 25 micron minimum dimension range) defects. The ADI Macro inspection system detects defects that appear after the photolithography development step and include regions of defocus ("hot spots"), scratches, pattern blemishes, large particles, (i. e. , particles greater than about 25 micron minimum dimension range), extra deposited photoresist, nonuniform photoresist deposition, and edge bead removal inconsistencies. Two fluorescent lamp tubes are used to illuminate the target area in dark field, and one fluorescent lamp tube is used in an oblique configuration to illuminate the target area in bright field.

59847697, Nov 16, 1999

Jan 6, 1998

9/003315

Doyle E. Bennett - Santa Clara CA
Thomas H. Osterheld - Mountain View CA
Fred C. Redeker - Fremont CA
Ginetto Addiego - Berkeley CA

Applied Materials, Inc. - Santa Clara CA

B24D 1100

451527

A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.

51645653, Nov 17, 1992

Apr 18, 1991

7/687473

Ginetto Addiego - Berkeley CA
Francois J. Henley - Los Gatos CA

Photon Dynamics, Inc. - Milpitas CA

B23K 2600

21912168

A laser-based repair system provides for material removal and deposition using a repair tool having a first laser operating at a high power for cutting signal lines and operating at a lower power for ablating a target repair area in conjunction with a liquid dispensing apparatus for application of the liquid solution in a target area, and a second laser for decomposing the liquid solution in an applied layer prior to the ablation of material in the target repair area. Various repair processes can be undertaken. The invention allows high-speed material deposition and removal on a surface. In a specific embodiment of the invention, the liquid solution used is a palladium acetate and a solvent or other metallo-organic solution which is capable of pyrolytic reaction and decomposition to an electrically conductive residue. A liquid applicator or dispensing apparatus is provided which is suited to applying fine traces of liquid without clogging. An optical head is provided which project beams from a plurality of lasers and surface illumination along a common axis with an optical viewing system for lighting a target workpiece for observing the repair in progress.

62802992, Aug 28, 2001

Feb 16, 2000

9/505577

Daniel Kennedy - San Jose CA
Boris Fuksshimov - San Jose CA
Victor Belitsky - Sunnyvale CA
Boris Fishkin - San Carlos CA
Kyle Brown - Sunnyvale CA
Tom Osterheld - Mountain View CA
Jeff Beeler - Campbell CA
Ginetto Addiego - Berkeley CA

Applied Materials, Inc. - Santa Clara CA

B24B 5702

451 67

The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

20190326147, Oct 24, 2019

Jun 5, 2019

16/432568

- Santa Clara CA, US
ENG SHENG PEH - Singapore, SG
SRINIVAS D. NEMANI - Sunnyvale CA, US
ARVIND SUNDARRAJAN - Singapore, SG
AVINASH AVULA - Sacramento CA, US
ELLIE Y. YIEH - San Jose CA, US
MICHAEL RICE - Pleasanton CA, US
GINETTO ADDIEGO - Hillsborough CA, US

H01L 21/673
B25J 11/00

Embodiments of a multi-cassette carrying case are provided herein. In some embodiments a method for transporting a substrate from a first processing device to a second processing device includes docking a substrate cassette to a first chamber; pumping down pressure in the substrate cassette; transferring a substrate through the first chamber to the substrate cassette; sealing the substrate cassette and moving the substrate cassette having the substrate disposed therein from the first chamber to a second chamber; docking the substrate cassette to the second chamber; and transferring the substrate from the substrate cassette through the second chamber.