Jae Myung Yoo

20070063763, Mar 22, 2007

Jul 6, 2006

11/483263

Jae Yoo - Pleasanton CA, US
Sung Son - Santa Clara CA, US
Myung Choi - San Jose CA, US
Young Kim - San Jose CA, US
Oh Yoon - Santa Clara CA, US
Sang-Kyun Han - Sunnyvale CA, US

G05F 1/10

327544000

Source transistor configurations are described for reducing leakage and delay within integrated circuits. Virtual power and ground nodes are supported with the use of stacked transistor configurations, such as a two transistor stack between a first virtual supply connection and VSS, and a second virtual supply connection and VDD. Gate drives of these stacked transistors are modulated with different voltage levels in response to the operating power mode of the circuit, for example active mode, active-standby mode, and deep power-down mode. Means for driving these source stacks are described. In one embodiment separate virtual nodes are adapted for different types of circuits, such as buffers, row address strobe, and column address strobe. Other techniques, such as directional placement of the transistors is also described.

20210286652, Sep 16, 2021

Mar 11, 2020

16/815172

- Sunnyvale CA, US
Partha Bhattacharya - Cupertino CA, US
Jae Yoo - Morgan Hill CA, US

Fortinet, Inc. - Sunnyvale CA

G06F 9/50
G06F 9/54
G06F 9/48
G06F 9/38
G06F 16/182
G06F 16/27
H04L 29/06

Systems and methods for adaptively provisioning a distributed event data store of a multi-tenant architecture are provided. According to one embodiment, a managed security service provider (MSSP) maintains a distributed event data store on behalf of each tenant of the MSSP. For each tenant, the MSSP periodically determines a provisioning status for a current active partition of the distributed event data store of the tenant. Further, when the determining indicates an under-provisioning condition exits, the MSSP dynamically increases number of resource provision units (RPUs) to be used for a new partition to be added to the partitions for the tenant by a first adjustment ratio. While, when the determining indicates an over-provisioning condition exists, the MSSP dynamically decreases the number of RPUs to be used for subsequent partitions added to the partitions for the tenant by a second adjustment ratio.

20210245296, Aug 12, 2021

Feb 6, 2020

16/783910

- Livermore CA, US
John ROEHLING - Livermore CA, US
Jae Hyuck YOO - Dublin CA, US

B23K 26/0622
H01M 8/124

The present disclosure relates to a system for laser processing of a ceramic electrolyte material. The system may include a controller, a laser responsive to the controller for generating a beam, and a beam forming subsystem. The beam forming subsystem controls a parameter of the beam generated by the laser. The beam forming subsystem further controls the beam to provide a laser fluence sufficient to produce densification of the ceramic electrolyte material.

20210149308, May 20, 2021

Jan 25, 2021

17/157634

- Santa Clara CA, US
Preston FUNG - Daly City CA, US
Sean SCREWS - San Jose CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

G03F 7/20

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

20210011390, Jan 14, 2021

Sep 28, 2020

17/035105

- Santa Clara CA, US
David Michael CORRIVEAU - Sacramento CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
WeiMin TAO - Palo Alto CA, US
Antoine P. MANENS - Saratoga CA, US

G03F 7/20

Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

20200272063, Aug 27, 2020

Feb 25, 2019

16/284516

- Santa Clara CA, US
David Michael CORRIVEAU - Sacramento CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
WeiMin TAO - Palo Alto CA, US
Antoine P. MANENS - Saratoga CA, US

G03F 7/20

Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

20200103760, Apr 2, 2020

Sep 28, 2018

16/146054

- Santa Clara CA, US
Preston FUNG - Santa Clara CA, US
Sean SCREWS - Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

G03F 7/20

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

20200011652, Jan 9, 2020

Jul 3, 2018

16/026982

- Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
Glen Alan GOMES - San Jose CA, US
David Michael CORRIVEAU - Sacramento CA, US
Thang Duc NGUYEN - Milpitas CA, US

G01B 9/02
G03F 7/20

Processing systems and methods used in the manufacturing of flat panel displays (FPDs) are provided herein. In one embodiment, a processing system features a motion stage movably disposed on a base surface, one or more X-position interferometers, and a plurality of Y-position interferometers. The X-position interferometers include an X-position mirror fixedly coupled to the motion stage and an X-axis stationary module fixedly coupled a non-moving surface of processing system. Each of the plurality of Y-position interferometers include one of a first or second Y-position mirror fixedly coupled to the motion stage in orthogonal relationship to the one or more X-position mirrors and one of a first or a second Y-axis stationary module fixedly coupled to a non-moving surface of the processing system. Here, each of the Y-axis stationary modules is positioned to direct coherent radiation towards a respective Y-position mirror when the Y-position interferometer thereof is in an active arrangement.