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Jason R Haaheim

from Chaska, MN
Age ~45
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Also known as:
Haaheim Jason
Related to:
Sadee M Haaheim, 28Mnikari G Roan, 45Andrew Haaheim, 37Michael R Haaheim, 57Dale R Haaheim, 86Mnikesa Haaheim
Connected to:
Annet Haak, 57Bryan R Haak, 37Danielle M Haak, 45Hunter HaakMarianne C Haak, 94Martin Haak, 66Ryan S HaakAudrey A Haake, 64Claudia Haake, 52Kyle Haake, 36

Jason Haaheim Phones & Addresses

  • Chaska, MN
  • 316 W 94Th St APT 2A, New York, NY 10025 (847) 894-1634
  • Goleta, CA
  • 4920 W Argyle St, Chicago, IL 60630
  • Evanston, IL
  • Anchorage, AK

Work

Company: Haaheim engineering Feb 2013 Address: Greater Chicago Area Position: Independent engineering consultant

Education

Degree: Master of Science, Masters School / High School: Uc Santa Barbara 2001 to 2003 Specialities: Electrical Engineering

Skills

Thin Films • Afm • Mems • Nanotechnology • Nanofabrication • Characterization • Semiconductors • R&D • Microfabrication • Microfluidics • Technical Writing • Product Development • Vacuum • Powder X Ray Diffraction • Ellipsometry • Product Management • Scanning Electron Microscopy • Materials Science • Silicon • Optoelectronics • Scanning Probe Microscopy • Nanomaterials • Microscopy • Medical Devices • Electron Beam Lithography • Pecvd • Lithography • Photolithography • Nanolithography • Sensors • Writing • Design of Experiments • Data Analysis • Metrology • Photonics

Languages

Spanish

Industries

Performing Arts

Resumes

Resumes

Jason Haaheim Photo 1

Adjunct Professor

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Location:
101 west End Ave, New York, NY 10023
Industry:
Performing Arts
Work:
Haaheim Engineering - Greater Chicago Area since Feb 2013
Independent Engineering Consultant
Education:
Uc Santa Barbara 2001 - 2003
Master of Science, Masters, Electrical Engineering Gustavus Adolphus College 1997 - 2001
Bachelors, Bachelor of Arts, Music, Physics Chaska Senior High School
Skills:
Thin Films
Afm
Mems
Nanotechnology
Nanofabrication
Characterization
Semiconductors
R&D
Microfabrication
Microfluidics
Technical Writing
Product Development
Vacuum
Powder X Ray Diffraction
Ellipsometry
Product Management
Scanning Electron Microscopy
Materials Science
Silicon
Optoelectronics
Scanning Probe Microscopy
Nanomaterials
Microscopy
Medical Devices
Electron Beam Lithography
Pecvd
Lithography
Photolithography
Nanolithography
Sensors
Writing
Design of Experiments
Data Analysis
Metrology
Photonics
Languages:
Spanish

Business Records

Name / Title
Company / Classification
Phones & Addresses
Jason Haaheim
Co-author
Nanoink Inc
Mfg Electrical Equipment/Supplies · Mfg Industrial Inorganic Chemicals · Electrical Equipment and Supplies, NEC
8025 Lamon Ave #410, Skokie, IL 60077
4901 Searle Pkwy, Skokie, IL 60077
(847) 679-6266, (847) 679-8767

Publications

Us Patents

Using Optical Deflection Of Cantilevers For Alignment

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US Patent:
8256017, Aug 28, 2012
Filed:
Aug 30, 2007
Appl. No.:
11/848211
Inventors:
Jason Haaheim - Chicago IL, US
Assignee:
NanoInk, Inc. - Skokie IL
International Classification:
G01Q 10/04
US Classification:
850 1, 850 2, 850 6, 850 52
Abstract:
A calibration leveling system and method are provided which improve printing and imaging at the nanoscale including improved tip-based deposition and nanolithography. The system can include a scanning probe instrument having a video camera with an adjustable lens. The scanner can be coupled to a one or two dimensional array of cantilevers comprising cantilever tips for imaging or printing. The scanning probe instrument has one or more motors for controlling the scanner in the z-axis. The z-axis motors position the scanner so that the cantilever tips are in a level orientation relative to the surface of a substrate. Once the cantilever tips are level with the substrate, the positions of the z-axis motors can be recorded for future reference.

Array And Cantilever Array Leveling

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US Patent:
8256018, Aug 28, 2012
Filed:
Feb 5, 2009
Appl. No.:
12/320842
Inventors:
Jason Haaheim - Chicago IL, US
Vadim Val-Khvalabov - Chicago IL, US
Assignee:
NanoInk, Inc. - Skokie IL
International Classification:
G01Q 60/24
US Classification:
850 33, 850 10, 850 5, 850 40, 850 56, 850 60
Abstract:
Faster and better methods for leveling arrays including software and user interface for instruments. A method comprising: (i) providing at least one array of cantilevers supported by at least one support structure, (ii) providing at least one substrate, (iii) providing at least one instrument to control the position of the array with respect to the substrate, (iv) leveling the array with respect to the substrate, wherein the leveling is performed via a user interface on the instrument which is adapted to have the user input positional information from the motors and piezoelectric extender when at least one cantilever deflects from the substrate. Uniform z-displacements can be achieved.

Active Pen Nanolithography

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US Patent:
8261662, Sep 11, 2012
Filed:
Nov 8, 2005
Appl. No.:
11/268740
Inventors:
Raymond Roger Shile - Los Gatos CA, US
Terrisa Duenas - Ventura CA, US
John Edward Bussan - Naperville IL, US
Gregory J. Athas - Lisle IL, US
Joseph S. Fragala - San Jose CA, US
Jason R. Haaheim - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US
Jeffrey R. Rendlen - Glen Ellyn IL, US
Assignee:
Nanolnk, Inc. - Skokie IL
International Classification:
H01L 21/02
US Classification:
101327, 977851
Abstract:
Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.

Fast Dip For Reduced Wicking In Nanolithograhic Ink Delivery

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US Patent:
20080055344, Mar 6, 2008
Filed:
Aug 30, 2007
Appl. No.:
11/848215
Inventors:
Jason Haaheim - Chicago IL, US
Gregory Athas - Lisle IL, US
International Classification:
B41J 27/00
US Classification:
346140100
Abstract:
A method of dipping a nanoscopic probe comprising dipping a nanoscopic tip at a dipping rate into an inkwell comprising ink, wherein the dipping rate is configured to be sufficiently faster than a rate of wicking. A nanoscopic probe comprising a nanoscopic tip and an inkwell configured to contain ink, wherein the nanoscopic probe is configured to dip into and retract from the ink at a rate that is sufficiently faster than wicking. Wicking can cause excessive amounts of ink to be deposited on nanoscopic tips, which can lead to contamination of inkwells and other nanoscopic tips.

Nanolithography With Use Of Viewports

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US Patent:
20080309688, Dec 18, 2008
Filed:
Mar 11, 2008
Appl. No.:
12/073909
Inventors:
Jason Haaheim - Chicago IL, US
Joseph S. Fragala - San Jose CA, US
Raymond R. Shile - Los Gatos CA, US
International Classification:
G01D 15/16
US Classification:
3461401
Abstract:
Two dimensional arrays of cantilevers for use in transferring inks from the cantilever tip to substrates are improved with use of viewports to view the cantilevers from a far side. This improves the leveling behavior when large numbers of cantilevers are present. It also provides for better laser access. Bioarrays and combinatorial applications are particularly important. Massively parallel direct write printing with more than 55,000 cantilever tips can be achieved.

Conducting Lines, Nanoparticles, Inks, And Patterning

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US Patent:
20100288543, Nov 18, 2010
Filed:
Apr 13, 2010
Appl. No.:
12/759572
Inventors:
Sheng-Chun Hung - Chicago IL, US
Omkar Nafday - Tallahassee FL, US
Jason R. Haaheim - Chicago IL, US
International Classification:
H05K 1/09
H05K 3/12
B32B 3/10
US Classification:
174257, 427 984, 4281951
Abstract:
Patterning and direct writing of nanoparticle inks formulated to provide conductive lines upon annealing. Patterning methods include stamp and tip based methods including microcontact printing and DPN printing. Ink viscosity, metal content, and density can be controlled to provide good results. Low temperature of annealing can be used to generate volume resistivities comparable to bulk resistivity. Long lines can be drawn. Addressable patterning can be achieved.

Leveling Devices And Methods

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US Patent:
20110014378, Jan 20, 2011
Filed:
Jul 16, 2010
Appl. No.:
12/838384
Inventors:
John Edward BUSSAN - Naperville IL, US
Sergey V. Rozhok - Skokie IL, US
Vadim Val-Khvalabov - Chicago IL, US
Joseph S. Fragala - San Jose CA, US
Jason R. Haaheim - Chicago IL, US
Michael R. Nelson - Libertyville IL, US
Edward R. Solheim - Mount Prospect IL, US
Javad M. Vakil - Morton Grove IL, US
International Classification:
B05D 3/12
G01Q 70/02
G01Q 70/00
G01Q 80/00
G01Q 20/02
F16M 13/00
US Classification:
427275, 850 53, 850 52, 850 62, 850 6, 24828811, 24828831, 24828111
Abstract:
Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions adapted to form a pattern on a surface of a substrate upon contact of the object to the surface; and at least one flexible joint assembly mounted to the support structure and adapted to allow the object to achieve a parallel orientation with respect to the surface upon contact of the object to the surface. Also provided are apparatuses and kits incorporating the devices and methods of making and using the devices and apparatuses.

Ball Spacer Method For Planar Object Leveling

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US Patent:
20110268882, Nov 3, 2011
Filed:
Apr 26, 2011
Appl. No.:
13/064925
Inventors:
John Edward Bussan - Naperville IL, US
Jason R. Haaheim - Chicago IL, US
John Moskal - Chicago IL, US
Edward R. Solheim - Mount Prospect IL, US
Vadim Val-Khvalabov - Chicago IL, US
Michael R. Nelson - Libertyville IL, US
Nabil A. Amro - Wheeling IL, US
Javad M. Vakil - Morton Grove IL, US
International Classification:
B05D 5/00
B05C 13/00
US Classification:
427256, 118663, 118500
Abstract:
An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.
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Jason R Haaheim from Chaska, MN, age ~45 Get Report