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Scott D Mccalmont

from Fort Madison, IA
Age ~68
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Also known as:
Scott Dixon Mccalmont, Scott Mc
Phone and address:
3297 Country Club Ln, Sawyer, IA 52627
(319) 372-0626
Related to:
Christine M Mccoy, 50Dennis M Mcdaniels, 43Raymond Mcgee, 49Shelly Mcmorrow, 47George L Mcguigan, 61Leslie Mccurdy
Connected to:
Tiffany A Mccalmon, 49Leonard Mccalop, 58Lorraine Mccalpin, 68Ronnie L Mccaman, 72Adam T Mccambridge, 41Carla J Mccambridge, 65Jeff L Mccambridge, 63Kim Mccambridge, 40Kristen Mccambridge, 42Robert S Mccambridge, 66

Scott Mccalmont Phones & Addresses

  • 3297 Country Club Ln, Fort Madison, IA 52627 (319) 372-0626
  • 1009 Avenue C, Fort Madison, IA 52627 (319) 372-0626
  • 1901 Avenue J, Fort Madison, IA 52627
  • Athens, PA
  • 119 Hillcrest Dr, Sayre, PA 18840 (570) 888-5000
  • York, PA

Resumes

Resumes

Scott Mccalmont Photo 1

Senior Process Engineer

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Location:
3297 Country Club Ln, Fort Madison, IA 52627
Industry:
Chemicals
Work:
Axalta Coating Systems
Senior Process Engineer
Dupont 1983 - 2013
Process Engineer
Education:
University of New Mexico School of Engineering 1978 - 1981
Master of Science, Masters, Chemical Engineering New Mexico Institute of Mining and Technology 1973 - 1977
Bachelors, Bachelor of Science, Biology, Chemistry
Skills:
Manufacturing
Chemical Engineering
Engineering
Continuous Improvement
Product Development
R&D
Process Improvement
Process Control
Instumentation
Scott Mccalmont Photo 2

Scott Mccalmont

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Publications

Us Patents

Peel-Apart Photosensitive Element

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US Patent:
52347907, Aug 10, 1993
Filed:
Feb 25, 1992
Appl. No.:
7/841398
Inventors:
Charles D. Lang - Wysox PA
Scott D. McCalmont - Athens PA
John Choi - Sayre PA
Anchi Hou - Towanda PA
Alan Shobert - Sayre PA
Assignee:
E. I. Du Pont de Nemours and Company - Wilmington DE
International Classification:
G03C 190
G03C 1112
G03F 726
US Classification:
430253
Abstract:
A multilayer, photosensitive element comprising a coversheet, a photohardenable layer, a contiguous layer, an isolation layer, an adhesive layer, and a support, is described. The element is used for image reproduction.

Photosensitive Elements And Their Process Of Use

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US Patent:
59392320, Aug 17, 1999
Filed:
Jul 1, 1997
Appl. No.:
8/886627
Inventors:
Dennis James Bellville - Barrington IL
Richard Albert Coveleskie - Sayre PA
Scott Dixon McCalmont - Sayre PA
Harvey Walter Taylor - Sayre PA
Gregory Charles Weed - Towanda PA
Assignee:
E. I. du Pont de Nemours and Company - Wilmington DE
International Classification:
G03C 173
US Classification:
430258
Abstract:
An element containing, in order: a first strippable substrate; a substantially transparent, non-photosensitive, polymeric isolation layer having a coating weight of 10 to 150 mg/dm. sup. 2 ; an elastomeric layer having a coating weight of 25 to 200 mg/dm. sup. 2 ; a pigmented photosensitive, preferably photopolymerizable layer; and a second different strippable substrate adjacent the photosensitive layer, wherein the photosensitive layer upon imagewise exposure to actinic radiation exhibits a lowered peel force relative to a system which does not have a polymeric isolation layer.
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Scott D Mccalmont from Fort Madison, IA, age ~68 Get Report