Search

Timothy R Piwonka-Corle

from Boulder, CO
Age ~63
Get Report
Also known as:
Timothy Richard Piwonka-Corle, Timothy P Piwonka-Corle, Timothy R Corle, Timothy P Corle, Timothy R Piwonka, Timothy Richard Corle, Timothy E, Corle Timothy Piwonka, Timothy L
Phone and address:
2100 Mesa Dr, Boulder, CO 80304
(303) 442-4047
Related to:
William Paul Stewart, 61John P Hunt, 56Michele Gay, 58Jennifer L Archuleta, 46Tabitha R Creel, 55Chiquita D Humphries, 58
Connected to:
Hannah Piwonka, 34Joyce P Piwonski, 83Judith M Piwonski, 84Daniel A Piwowarczyk, 46Joyce Piwowarski, 53Ronald R Piwowarski, 38Todd G Piwowar, 50Roxann M Pixler, 71Crystal Pixley, 47Mandy Pixley, 47

Timothy Piwonka-Corle Phones & Addresses

  • 2100 Mesa Dr, Boulder, CO 80304 (303) 442-4047
  • Portland, OR
  • Mountain View, CA
  • Palo Alto, CA

Work

Company: Kärcher north america inc. Jan 1, 2015 to 2017 Position: Advanced development and innovation director at kã rcher north america inc

Education

Degree: Master of Business Administration, Masters School / High School: Escp Business School 2005 to 2006 Specialities: Business

Skills

R&D • Manufacturing • Testing • Program Management • Electronics • Product Management • Business Development • Sensors • Semiconductors • Six Sigma • Management • Business Planning • Semiconductor Industry • Technology Management • Product Development • Failure Analysis • Embedded Systems • Research and Development

Languages

German

Industries

Executive Office

Resumes

Resumes

Timothy Piwonka-Corle Photo 1

Director Of Legal Services

View page
Location:
Boulder, CO
Industry:
Executive Office
Work:
Kärcher North America Inc. Jan 1, 2015 - 2017
Advanced Development and Innovation Director at Kã Rcher North America Inc
Kärcher North America Inc. Jan 1, 2015 - 2017
Director of Legal Services
Brooks Automation 2013 - 2015
Senior Director of Innovation and Instrumentation Engineering
Brooks Automation 2010 - 2013
Director of Engineering
H2O3 Pure Water 2007 - 2010
President
Education:
Escp Business School 2005 - 2006
Master of Business Administration, Masters, Business Stanford University 1983 - 1989
Doctorates, Doctor of Philosophy, Applied Physics University of Colorado Boulder 1979 - 1983
Bachelors, Bachelor of Arts, Physics
Skills:
R&D
Manufacturing
Testing
Program Management
Electronics
Product Management
Business Development
Sensors
Semiconductors
Six Sigma
Management
Business Planning
Semiconductor Industry
Technology Management
Product Development
Failure Analysis
Embedded Systems
Research and Development
Languages:
German

Publications

Us Patents

Focused Beam Spectroscopic Ellipsometry Method And System

View page
US Patent:
6734967, May 11, 2004
Filed:
Feb 11, 1999
Appl. No.:
09/248876
Inventors:
Timothy R. Piwonka-Corle - Portland OR
Karen F. Scoffone - Redwood City CA
Xing Chen - San Jose CA
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
John-Pierre Rey - Fontenay Aux Roses, FR
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G01N 2121
US Classification:
356369
Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument.

Signal Acquisition Probing And Voltage Measurement Systems Using An Electro-Optical Cavity

View page
US Patent:
7221813, May 22, 2007
Filed:
Mar 10, 2005
Appl. No.:
11/077787
Inventors:
Christopher P. Yakymyshyn - Seminole FL, US
William Q. Law - Beaverton OR, US
William A. Hagerup - Portland OR, US
Timothy R. Piwonka-Corle - Portland OR, US
Assignee:
Tektronix, Inc. - Beaverton OR
International Classification:
G02B 6/00
G01R 31/00
G01B 9/02
US Classification:
385 12, 385 2, 385 8, 385 39, 385 40, 385 14, 324501, 356454
Abstract:
A signal acquisition probing system uses an optical cavity to acquire a signal under test. The probing system has an optical transmitter and receiver that are coupled to the optical cavity via an optical transmission system. The optical cavity has an electrode structure having apertures formed in the optical cavity that are parallel to propagation path of the optical signal within the cavity. A modulated optical signal is generated by the optical cavity in response to the signal under test creating an electro-magnetic field distribution in electro-optic material in the optical cavity that overlaps the optical path of the optical signal propagating in the optical cavity which varies the index of refraction of electro-optic material in the optical path. The signal acquisition probing system is connected to a measurement instrument to form a voltage measurement system.

Variable Attenuation Signal Acquisition Probing And Voltage Measurement Systems Using An Electro-Optical Cavity

View page
US Patent:
7310455, Dec 18, 2007
Filed:
Mar 10, 2005
Appl. No.:
11/077788
Inventors:
Christopher P. Yakymyshyn - Seminole FL, US
Timothy R. Piwonka-Corle - Portland OR, US
William Q. Law - Beaverton OR, US
William A. Hagerup - Portland OR, US
Assignee:
Tektronix, Inc. - Beaverton OR
International Classification:
G02B 6/00
G02F 1/07
US Classification:
385 12, 359256
Abstract:
A variable attenuation signal acquisition probing system and voltage measurement system uses an optical cavity to acquire a signal under test. The probing system has an optical transmitter and receiver that are coupled to the optical cavity via an optical transmission system. The optical cavity has an electrode structure having apertures formed in the optical cavity that are parallel to propagation path of the optical signal within the cavity. A modulated optical signal is generated by the optical cavity in response to the signal under test creating an electromagnetic field distribution in electro-optic material in the optical cavity that overlaps the optical path of the optical signal propagating in the optical cavity which varies the index of refraction of electro-optic material in the optical path. Changes in the polarization state of the optical signal attenuates the magnitude of the output electrical signal of the optical receiver.

Variable Attenuation Signal Acquisition Probing And Voltage Measurement Systems Using An Electro-Optical Cavity

View page
US Patent:
7424177, Sep 9, 2008
Filed:
Mar 2, 2007
Appl. No.:
11/681709
Inventors:
Christopher P. Yakymyshyn - Seminole FL, US
Timothy R. Piwonka-Corle - Portland OR, US
William Q. Law - Beaverton OR, US
William A. Hagerup - Portland OR, US
Assignee:
Tektronix, Inc. - Beaverton OR
International Classification:
G02B 6/00
US Classification:
385 12
Abstract:
A variable attenuation signal acquisition probing system and voltage measurement system uses an optical cavity to acquire a signal under test. The probing system has an optical transmitter and receiver that are coupled to the optical cavity via an optical transmission system. The optical cavity has an electrode structure having apertures formed in the optical cavity that are parallel to propagation path of the optical signal within the cavity. A modulated optical signal is generated by the optical cavity in response to the signal under test creating an electro-magnetic field distribution in electro-optic material in the optical cavity that overlaps the optical path of the optical signal propagating in the optical cavity which varies the index of refraction of electro-optic material in the optical path. Changes in the polarization state of the optical signal attenuates the magnitude of the output electrical signal of the optical receiver.

Focused Beam Spectroscopic Ellipsometry Method And System

View page
US Patent:
20040100632, May 27, 2004
Filed:
Nov 18, 2003
Appl. No.:
10/716805
Inventors:
Timothy Piwonka-Corle - Portland OR, US
Karen Scoffone - Redwood City CA, US
Xing Chen - San Jose CA, US
Lloyd Lacomb - Santa Clara CA, US
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
Jean-Pierre Rey - Fontenay Aux Roses, FR
International Classification:
G01J004/00
US Classification:
356/364000
Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

Focused Beam Spectroscopic Ellipsometry Method And System

View page
US Patent:
20050105090, May 19, 2005
Filed:
Dec 7, 2004
Appl. No.:
11/007420
Inventors:
Timothy Piwonka-Corle - Portland OR, US
Karen Scoffone - Redwood City CA, US
Xing Chen - San Jose CA, US
Lloyd Lacomb - Santa Clara CA, US
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
John-Pierre Rey - Fontenay Aux Roses, FR
International Classification:
G01J004/00
US Classification:
356369000
Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

Focused Beam Spectroscopic Ellipsometry Method And System

View page
US Patent:
59108428, Jun 8, 1999
Filed:
Nov 27, 1996
Appl. No.:
8/753696
Inventors:
Timothy R. Piwonka-Corle - Portland OR
Xing Chen - San Jose CA
Lloyd J. Lacomb - Santa Clara CA
Jean-Louis Stehle - Colorbes, FR
Dorian Zahorski - Vannes, FR
Assignee:
Kla-Tencor Corporation - San Jose CA
International Classification:
G01N 2121
US Classification:
356369
Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument.

Focused Beam Spectroscopic Ellipsometry Method And System

View page
US Patent:
56085265, Mar 4, 1997
Filed:
Jan 19, 1995
Appl. No.:
8/375353
Inventors:
Timothy R. Piwonka-Corle - Portland OR
Karen F. Scoffone - Redwood City CA
Xing Chen - San Jose CA
Lloyd J. Lacomb - Santa Clara CA
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
Jean-Pierre Rey - Fontenay Aux Roses, FR
Assignee:
Tencor Instruments - Santa Clara CA
International Classification:
G01N 2121
US Classification:
356369
Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape,to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument.
Control profile
Timothy R Piwonka-Corle from Boulder, CO, age ~63 Get Report