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Timothy B Stachowiak

from Austin, TX
Age ~45
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Also known as:
Timothy Brian Stachowiak, Tim B Stachowiak, Timothy B Stachwiak
Phone and address:
1501 W 29Th St, Austin, TX 78703
Related to:
Noel TurmanBen Holub, 71Marilyn A Drake, 77Catherine Collins, 68Daniel Stachowiak, 57
Connected to:
Aleksandra Stachowiak, 41Aleksandra Stachowska, 69Ashley E Stachowski, 43Courtney M Stachowicz, 54Jamie Stachowski, 34Jenna StachowiakKatarzyna A Stachura, 37Lauren A Stachura, 41Monika Stachura, 43Sebastian Stachurski, 28

Timothy Stachowiak Phones & Addresses

  • 1501 W 29Th St, Austin, TX 78703
  • Fremont, CA
  • Oakland, CA
  • Berkeley, CA
  • Rockwall, TX

Resumes

Resumes

Timothy Stachowiak Photo 1

Director, National Accounts At Ventura Foods, Llc

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Publications

Us Patents

Method And System For Separating Analytes

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US Patent:
20100059442, Mar 11, 2010
Filed:
Nov 16, 2007
Appl. No.:
12/514678
Inventors:
David Nurok - Indianapolis IN, US
Allyson L. Novotny - Indianapolis IN, US
Timothy Stachowiak - Oakland CA, US
Frantisek Svec - Alameda CA, US
International Classification:
B01D 15/08
US Classification:
210656, 2101982
Abstract:
A method and device for performing chromatography includes placing a monolithic polymer layer in contact with a liquid mobile phase. The monolithic polymer layer may be neutral, positively charged, or negatively charged. A first electrode and second electrode are coupled to the monolithic polymer layer. An electrical potential is created between the first electrode and the second electrode. In some embodiments, the monolithic polymer layer may be placed in a sealed chamber, which may have a pressure greater than atmospheric pressure. Additionally, in some embodiments, the mobile phase is advanced through the monolithic polymer layer via one of a number of forced flow techniques.

Photocurable Composition For Forming Cured Layers With High Thermal Stability

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US Patent:
20220185914, Jun 16, 2022
Filed:
Dec 15, 2020
Appl. No.:
17/122056
Inventors:
- Tokyo, JP
Weijun LIU - Cedar Park TX, US
Fei LI - Austin TX, US
Timothy Brian STACHOWIAK - Austin TX, US
International Classification:
C08F 2/50
C08F 212/08
B05D 3/06
C08F 222/10
B32B 27/26
B32B 27/30
Abstract:
A photocurable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise at least one multi-functional vinylbenzene in an amount of 15 wt % to 85 wt % and at least one multi-functional acrylate monomer in an amount of 15 wt % to 85 wt % based on the total weight of the photocurable composition. A photo-cured layer of the photocurable composition can have a high heat stability up to 400 C. and a glass transition temperature of at least 135 C.

Curable Composition For Making Cured Layer With High Thermal Stability

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US Patent:
20220185915, Jun 16, 2022
Filed:
Dec 16, 2020
Appl. No.:
17/124063
Inventors:
- Tokyo, JP
Timothy Brian STACHOWIAK - Austin TX, US
Fen Wan - Austin TX, US
Weijun LIU - Cedar Park TX, US
International Classification:
C08F 2/50
C08F 22/40
B05D 3/06
C08F 212/08
B32B 27/26
B32B 27/28
B32B 27/34
C08F 20/58
Abstract:
A curable composition can comprise a polymerizable material and a photo-initiator, wherein the polymerizable material can comprise a first monomer including at least one bismaleimide-monomer and at least one second monomer. The curable composition can have a viscosity of not greater than 30 mPas, and a cured layer of the curable composition can have a high thermal stability up to 350 C.

Method Of Forming A Photo-Cured Layer

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US Patent:
20230103545, Apr 6, 2023
Filed:
Oct 5, 2021
Appl. No.:
17/450009
Inventors:
- Tokyo, JP
Timothy Brian Stachowiak - Austin TX, US
International Classification:
G03F 7/00
C08F 20/16
C08F 20/30
C08F 20/68
Abstract:
A method of forming a photo-cured layer on a substrate can include applying a first photocurable composition overlying a first region of the substrate and a second photocurable composition overlying a second region of the substrate and photo-curing the applied compositions, wherein the first region is a center region of the substrate and the second region is an edge region of the substrate, and the second photocurable composition has a higher vapor pressure than the first photocurable composition. The method can have the advantage that the forming of an extrusion within the edge region of the photo-cured layer can be avoided or being kept very low.

Planarization Method And Photocurable Composition

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US Patent:
20210394230, Dec 23, 2021
Filed:
May 14, 2021
Appl. No.:
17/320906
Inventors:
- Tokyo, JP
Naoki Kiyohara - Tokyo, JP
Keiko Chiba - Tochigi, JP
Timothy Brian Stachowiak - Austin TX, US
Keiji Yamashita - Tochigi, JP
International Classification:
B05D 1/36
G03F 7/09
G03F 7/16
B05D 3/12
B05D 3/06
B05D 5/00
Abstract:
A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.

Method Of Forming A Cured Layer By Controlling Drop Spreading

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US Patent:
20210157236, May 27, 2021
Filed:
Nov 22, 2019
Appl. No.:
16/692838
Inventors:
- Tokyo, JP
Timothy Brian STACHOWIAK - Austin TX, US
Edward Brian FLETCHER - Austin TX, US
International Classification:
G03F 7/16
G03F 7/00
G03F 7/095
Abstract:
A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.

Pattern Forming Method And Methods For Manufacturing Processed Substrate, Optical Component And Quartz Mold Replica As Well As Coating Material For Imprint Pretreatment And Set Thereof With Imprint Resist

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US Patent:
20190391484, Dec 26, 2019
Filed:
Aug 30, 2019
Appl. No.:
16/556836
Inventors:
- Tokyo, JP
Shingo Ishida - Utsunomiya-shi, JP
Toshiaki Ando - Utsunomiya-shi, JP
Toshiki Ito - Kawasaki-shi, JP
Timothy Brian Stachowiak - Austin TX, US
Weijun Liu - Cedar Park TX, US
International Classification:
G03F 7/00
H01L 21/027
Abstract:
The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.

Substrate Pretreatment For Reducing Fill Time In Nanoimprint Lithography

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US Patent:
20180272634, Sep 27, 2018
Filed:
May 25, 2018
Appl. No.:
15/989728
Inventors:
- Tokyo, JP
Timothy Brian Stachowiak - Austin TX, US
Weijun Liu - Cedar Park TX, US
International Classification:
B29D 11/00
G03F 7/00
B29C 59/00
B29C 59/02
Abstract:
A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.
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Timothy B Stachowiak from Austin, TX, age ~45 Get Report