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Urvil B Shah

from Mokena, IL
Age ~72

Urvil Shah Phones & Addresses

  • 9923 Cambridge Ct, Mokena, IL 60448 (708) 479-7134 (815) 479-7134
  • 9923 Cambridge Ct APT C, Mokena, IL 60448 (708) 479-7134
  • Chicago, IL
  • Hoffman Estates, IL
  • Woodridge, IL
  • Algonquin, IL
  • Chicago Ridge, IL
  • Tinley Park, IL
  • 9923 Cambridge Ct, Mokena, IL 60448 (708) 473-8187

Work

Position: Production Occupations

Education

Degree: Bachelor's degree or higher

Resumes

Resumes

Urvil Shah Photo 1

Senior Scientist

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Location:
Chicago, IL
Industry:
Chemicals
Work:
Hallstar
Senior Scientist
Urvil Shah Photo 2

Senior Scientist

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Location:
Mokena, IL
Industry:
Chemicals
Work:
Hallstar
Senior Scientist
Urvil Shah Photo 3

Urvil Shah

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Urvil Shah Photo 4

Urvil Shah

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Urvil Shah Photo 5

Urvil Shah

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Publications

Us Patents

Sunscreen Compositions And Methods And Materials For Producing The Same

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US Patent:
6485713, Nov 26, 2002
Filed:
Mar 5, 2002
Appl. No.:
10/092132
Inventors:
Craig A. Bonda - Winfield IL
Urvil B. Shah - Mokena IL
Robert J. Mcmillin - Oak Lawn IL
Magda M. Roth - Homewood IL
Assignee:
The C. P. Hall Company - Chicago IL
International Classification:
A61K 742
US Classification:
424 59, 424 60, 424400, 424401
Abstract:
A method of preparing a sunscreen including a solvent system and a filter system, the method including the step of controlling the polarity of the solvent system to control the rate of photodecay of the filter system, as well as sunscreen compositions and compounds for producing sunscreen compositions, are disclosed.

Photostabilizers, Uv Absorbers, And Methods Of Photostabilizing A Sunscreen Composition

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US Patent:
6800274, Oct 5, 2004
Filed:
Nov 22, 2002
Appl. No.:
10/302423
Inventors:
Craig A. Bonda - Winfield IL
Anna B. Pavlovic - Elmwood Park IL
Urvil B. Shah - Mokena IL
Assignee:
The C.P. Hall Company - Chicago IL
International Classification:
A61K 764
US Classification:
424 60, 424 59, 558400, 560 81
Abstract:
Polymers and compounds including a diphenylmethylene or a 9H-fluorene moiety; and sunscreen compositions including a mixture of a photoactive compound and any one of the foregoing derivatives are disclosed herein. Also disclosed are methods for stabilizing a sunscreen composition by the addition of one or more of the foregoing derivatives, methods of filtering out ultra-violet light from a substrate by the use of one or more such derivatives, and methods for terminating a polymerization reaction by the addition of derivatives of diphenylmethylene and/or 9H-fluorene.

Photostabilizers, Uv Absorbers, And Methods Of Photostabilizing A Sunscreen Composition

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US Patent:
6962692, Nov 8, 2005
Filed:
Mar 11, 2003
Appl. No.:
10/385833
Inventors:
Craig A. Bonda - Winfield IL, US
Anna Pavlovic - Elmwood Park IL, US
Urvil B. Shah - Mokena IL, US
Assignee:
CPH Innovations Corp. - Chicago IL
International Classification:
A61K007/64
US Classification:
424 60, 424 59, 558400, 560 81
Abstract:
Polymers and compounds including a diphenylmethylene or a 9H-fluorene moiety; and sunscreen compositions including a mixture of a photoactive compound and any one of the foregoing derivatives are disclosed herein. Also disclosed are methods for stabilizing a sunscreen composition by the addition of one or more of the foregoing derivatives, methods of filtering out ultra-violet light from a substrate by the use of one or more such derivatives, and methods for terminating a polymerization reaction by the addition of derivatives of diphenylmethylene and/or 9H-fluorene. Synergistic combinations of the polymer with (1) diesters or polyesters of a naphthalene dicarboxylic acid, or (2) oxybenzone enhance the photostability of sunscreen compositions containing a photodegradable sunscreen active compound, such as avobenzone.

Low Polarity Dimerate And Trimerate Esters As Plasticizers For Elastomers

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US Patent:
7109264, Sep 19, 2006
Filed:
Jul 10, 2003
Appl. No.:
10/616658
Inventors:
Stephen E. O'Rourke - Bolingbrook IL, US
Kimberly L. Stefanisin - Oak Lawn IL, US
Gary Wentworth - Chicago IL, US
Urvil B. Shah - Mokena IL, US
Assignee:
CPH Innovations Corp. - Chicago IL
International Classification:
A61L 15/62
C08K 5/09
C08K 5/10
C08K 5/101
US Classification:
524305, 524315
Abstract:
An elastomeric composition including a natural or synthetic rubber, and a cyclic dimerate ester and/or a cyclic trimerate ester plasticizer.

Low Polarity Dimerate And Trimerate Esters As Plasticizers For Thermoplastic Polymer/Elastomer Composites

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US Patent:
7232855, Jun 19, 2007
Filed:
Feb 7, 2003
Appl. No.:
10/360294
Inventors:
Stephen O'Rourke - Bolingbrook IL, US
Kimberly L. Stefanisin - Oak Lawn IL, US
Gary Wentworth - Chicago IL, US
Urvil B. Shah - Mokena IL, US
Yen Vu - Westmont IL, US
Assignee:
CPH Innovations Corp. - Chicago IL
International Classification:
C08K 5/12
US Classification:
524285, 524502
Abstract:
A thermoplastic polymer/elastomer composite composition including one or more thermoplastic polymers, a natural or synthetic rubber, and a long chain cyclic dimerate ester and/or long chain cyclic trimerate ester plasticizer.

Method Of Decreasing The Uv Light Degradation Of Polymers

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US Patent:
7544350, Jun 9, 2009
Filed:
May 6, 2005
Appl. No.:
11/123925
Inventors:
Craig A. Bonda - Winfield IL, US
Stephen O'Rourke - Bolingbrook IL, US
Anna Pavlovic - Elmwood Park IL, US
Urvil B. Shah - Mokena IL, US
Assignee:
Hallstar Innovations Corp. - Chicago IL
International Classification:
A61K 8/18
US Classification:
424 59, 424 60, 560 81
Abstract:
A method of decreasing the UV light degradation of a UV-light degradable polymer comprising adding to said polymer an effective amount of a compound of formula (IX):.

Biopolymer Compositions Having Improved Flexibility

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US Patent:
8158731, Apr 17, 2012
Filed:
Jan 27, 2010
Appl. No.:
12/694426
Inventors:
Kimberly L. Stefanisin - Oak Lawn IL, US
Urvil B. Shah - Mokena IL, US
Stephen O'Rourke - Bolingbrook IL, US
Gary Wentworth - Morris IL, US
Assignee:
Hallstar Innovations Corp. - Chicago IL
International Classification:
C08G 63/02
US Classification:
525437, 525418, 525450, 528272
Abstract:
The present disclosure is directed to polymer blends comprising a biopolymer and a substituted or unsubstituted aliphatic polyester. The aliphatic polyester comprises repeating units derivable from a substituted or unsubstituted aliphatic diacid, repeating units derivable from a substituted or unsubstituted aliphatic diol, and one or two terminator units derivable from a substituted or unsubstituted aliphatic alcohol. The polymer blends disclosed herein provide improved flexibility, and are useful, for example, in the production of packaging materials, industrial products, durable goods, and the like.

Ultraviolet Radiation Absorbing Waxes Useful In Cosmetic Compositions

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US Patent:
6355261, Mar 12, 2002
Filed:
Dec 2, 1999
Appl. No.:
09/452929
Inventors:
Craig A. Bonda - Wheaton IL
Urvil B. Shah - Mokena IL
Peter J. Marinelli - Barlett IL
Assignee:
The C. P. Hall Company - Bedford Park IL
International Classification:
A61K 600
US Classification:
424401, 424 59, 424 63, 424 64
Abstract:
The compounds of formula (I), suitable solvents for the compounds, and use of the compounds as waxes, UV absorbers, and skin conditioners is disclosed. A compound of formula (I) is a wax at room temperature, absorbs UVA and UVB radiation, and boosts the sun protection factor of sunscreen compositions. The compounds of formula (I) have utility in a variety of cosmetics and other compositions including waxes for coating, polishing, and sealing, textile and leather manufacture, adhesives, and crafts. The compounds of formula (I) also have utility in the treatment of skin conditions including acne, psoriasis, seborrheic dermatitis, dandruff, warts, corns, calluses, ringworm infection, wrinkling, yellowing, leatheriness, mottling, and hyperpigmentation.
Urvil B Shah from Mokena, IL, age ~72 Get Report