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Vassil Spasov Phones & Addresses

  • Palo Alto, CA
  • Soda Springs, CA
  • Davis, CA
  • 430 Navaro Pl, San Jose, CA 95134
  • 430 Navaro Pl UNIT 120, San Jose, CA 95134
  • 1555 Sierra St, Reno, NV 89503
  • Berkeley, CA
  • Santa Clara, CA
  • 870 Altaire Walk, Palo Alto, CA 94303

Work

Company: Kla-tencor Nov 2011 Address: Milpitas Position: Systems manager

Education

Degree: postdoc School / High School: University of California, Berkeley 1999 to 2000 Specialities: Chemical Physics

Skills

Optics • Systems Engineering • Physics • Image Processing • Imaging

Languages

English • Bulgarian • German • Russian

Interests

Electronics • Reading

Industries

Biotechnology

Resumes

Resumes

Vassil Spasov Photo 1

Systems Engineering Manager At Kla-Tencor

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Location:
430 Navaro Pl, San Jose, CA 95134
Industry:
Biotechnology
Work:
KLA-Tencor - Milpitas since Nov 2011
Systems Manager

Pacific Biosciences Nov 2010 - Nov 2011
Staff System Eng.

KLA-Tencor Mar 2000 - Nov 2010
systems engineer

Bulgarian Academy of Sciences 1991 - 1994
physicist
Education:
University of California, Berkeley 1999 - 2000
postdoc, Chemical Physics
University of Nevada-Reno 1994 - 1999
Ph.D., Chemical Physics
Sofia University St. Kliment Ohridski 1986 - 1991
M.Sc., physics, lasers
Skills:
Optics
Systems Engineering
Physics
Image Processing
Imaging
Interests:
Electronics
Reading
Languages:
English
Bulgarian
German
Russian

Publications

Us Patents

Electron Beam Apparatus And Inspection Method Using Dual Illumination Beams With Dynamically Controllable Offsets

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US Patent:
7838832, Nov 23, 2010
Filed:
Jun 6, 2008
Appl. No.:
12/135058
Inventors:
Marian Mankos - Palo Alto CA, US
Vassil Spasov - San Jose CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
H01J 37/26
G01N 23/225
US Classification:
250310, 250307
Abstract:
An apparatus for generating a dual-energy electron beam. The apparatus includes a first electron beam source configured to generate a lower-energy electron beam, and a second electron beam source configured to generate a higher-energy electron beam. The apparatus further includes a combining device for forming the dual-energy electron beam by combining the lower-energy and higher-energy electron beams. In addition, a first controllable electron-beam deflector is configured to provide a controllable offset of a first area illuminated by the lower-energy electron beam in relation to an image data collection area, and a second controllable electron-beam deflector configured to provide a controllable offset of a second area illuminated by the higher-energy electron beam in relation to the image data collection area. A moving stage and a time delay integration detection system are utilized. Other embodiments, aspects and features are also disclosed.

High-Resolution, Low-Distortion And High-Efficiency Optical Coupling In Detection System Of Electron Beam Apparatus

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US Patent:
7566873, Jul 28, 2009
Filed:
Dec 14, 2006
Appl. No.:
11/638805
Inventors:
David Walker - Livermore CA, US
Salam Harb - Los Gatos CA, US
Vassil Spasov - San Jose CA, US
David Stites - St. Petersburg FL, US
Izzy Lewis - San Jose CA, US
Marian Mankos - Palo Alto CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G01N 23/00
G21K 7/00
US Classification:
250310, 250306, 250307, 250311, 2504921, 250396 R, 2503362, 2503581, 2503601, 850 9, 850 11
Abstract:
One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. The apparatus further includes a detection system which includes a scintillating screen, a detector array, and an optical coupling apparatus positioned therebetween. The optical coupling apparatus includes both refractive and reflective elements. Other embodiments and features are also disclosed.
Vassil A Spasov from Palo Alto, CA, age ~57 Get Report